Equipment Type:

Cleanroom Instrumentation

Lithography

Nano and Micro Fabrication

Instrument Capabilities

The SUSS MA6 mask aligner is a photolithography system that provides multiple wafer-to-mask contact modes, including soft, hard, and vacuum-assisted contact. The 350 W lamp provides uniform UV illumination with computer-controlled intensity modulation for reliable and repeatable exposures.

Features

• Lithography feature resolution of 1 μm readily achieved
• Mask holders for 4″, 5″ and 7″ square masks
• Substrate holders for 3, 4- and 6-inch wafers
• Substrate thickness up to 0.25″ allowed
• Exposures at 365 (i-line) and 405 nm (h-line).
• Only top side alignment available

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

• UT Users: $6
• Higher Education/State Agencies: $10
• Corporate/External Users: $10

Cleanroom Facility

• UT Users: $35/hour
• Higher Education/State Agencies (Assisted): $92/hour
• Corporate/External Users (Assisted): $94/hour
• Higher Education/State Agencies (Unassisted): $64/hour
• Corporate/External Users (Unassisted): $65/hour

Please contact Dr. Raluca Gearba and/or James Smitherman to schedule a training session.