Equipment Type:

Cleanroom Instrumentation

Thin Film Fabrication

Instrument Capabilities

The Laurell WS-650 Spincoater is installed in the photolithography hood and is dedicated to spin coating commercially available photoresists. The system provides controlled and uniform photoresist coating for photolithography processes.

System Characteristics

• Speeds: 100-12,000 RPM
• Substrate size: up to 150 mm round substrates and 125 mm square substrates, thickness: 0.1 to 1 mm
• Wafer Fragment Adapter for 10 – 50 mm substrate fragments
• Microscope Slide adapter

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

• UT Users: $6
• Higher Education/State Agencies: $10
• Corporate/External Users: $10

Cleanroom Facility

• UT Users: $35/hour
• Higher Education/State Agencies (Assisted): $92/hour
• Corporate/External Users (Assisted): $94/hour
• Higher Education/State Agencies (Unassisted): $64/hour
• Corporate/External Users (Unassisted): $65/hour

Training Fees

• UT Users: $30
• Higher Education/State Agencies: $51
• Corporate/External Users: $65

Please contact Dr. Raluca Gearba and/or James Smitherman to schedule a training session.