Equipment Type:

Cleanroom Instrumentation

Thin Film Fabrication

Information the Equipment Can Provide

System Characteristics:

• Four 15 cc -beam sources for metals and certain oxides
• One RF sputter head for oxides and metals
• One DC sputter head for metals
• Targets for sputtering should be 3″ diameter and 1/8″ to 1/4″ thickness
• Base pressure achieved by pumping overnight: 5 -07 Torr
• E-beam substrate available
• Film thickness monitored using a crystal sensor.
• Sample rotation available
• Deposition process is fully manual

E-beam materials provided by TMI: Ag, Al, Cu, Ti, SiO2, Cr and Au. Gold usage will be charged at a $70/gram rate. The gold crucible should be checked-out from TMI staff.

Sputtering targets provided by TMI: Al and Cr.

All other materials must be provided by the user.

Please download and read the Standard Operating Procedure (SOP) for this equipment before use.

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

• UT Users: $6
• Higher Education/State Agencies: $10
• Corporate/External Users: $10

Cleanroom Facility

• UT Users: $35/hour
• Higher Education/State Agencies (Assisted): $92/hour
• Corporate/External Users (Assisted): $94/hour
• Higher Education/State Agencies (Unassisted): $64/hour
• Corporate/External Users (Unassisted): $65/hour

To become a new user of this facility, please read the Instrument Reservation Information page. If you are already a user you can make a reservation in FBS.

To become a user of this instrument you must first complete the Cleanroom Safety Class. Please contact the facility manager to schedule a training session.