Equipment Type:

Cleanroom Instrumentation

Nano and Micro Fabrication

Thin Film Fabrication

Features:

• The YES prime oven dehydrates the wafers at 150°C and primes the wafers using hexamethyldisilazane (HMDS) allowing better coverage and adhesion between oxides are resists.
• Controlled vapor-phase HMDS priming for uniform surface treatment.
• The HMDS oven is configured with settings 0 and 1 which correpsond to 5 minutes and 1 minute prime, respectively.
• Precise temperature and process time control for repeatable results.
• Uniform HMDS vapor distribution across the substrate.
• Vacuum-assisted process to enhance adhesion promotion.
• Compatible with silicon, glass, quartz, and other substrate materials.
• Available holders for wafer sizes: 3 inches and 4 inches; smaller pieces can be mounted on a carrier wafer using the provided heat resistant Kapton tape.

CAUTION:

The oven idles/runs at 150°C, therefore be careful when loading/unloading wafers! Use the provided heat-resistant gloves to load/unload the wafer carriers.
 

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

• UT Users: $6
• Higher Education/State Agencies: $10
• Corporate/External Users: $10

Cleanroom Facility

• UT Users: $35/hour
• Higher Education/State Agencies (Assisted): $92/hour
• Corporate/External Users (Assisted): $94/hour
• Higher Education/State Agencies (Unassisted): $64/hour
• Corporate/External Users (Unassisted): $65/hour

Please contact Dr. Raluca Gearba and/or James Smitherman to schedule a training session.