Equipment: Raith 50 Electron Beam Lithography Tool
RAITH50 is a general purpose electron beam lithography (EBL) tool used for research and develop- ments in the fields of MEMS and diffractive optical elements. The Raith 50 system is a research tool that can be used to pattern wafers of up to 2 inch. It uses finely focused beam of electrons to define structures with dimensions of 20 nm. It is equipped with a laser interferometer stage which facilitates precise multilevel lithography with automatic mark recognition and patterns to be stitched together. The nanolithography system can be used for mesoscopic and quantum device fabrication, or other ultra high resolution patterning.
- Beam energy selectable between 500V-30kV
- LaB6 source with electrostatic beam blanker
- SEM operating mode for high resolution imaging
- Fast pattern generator with up to 4MHz writing speed
$35.00 per hour for UT Austin users
$74.00 per hour for external university users
$152.00 per hour for corporate users
Facility User Education
To become a user of this instrument please sign up for the next available NT201 and NT205 facility user education classes. External/Corporate users must contact CNM to setup an account before attending facility user education classes.
NT201 Cleanroom Safety Fee: $25.00
NT205 EBL Fee: $120.00
Dr. Damon Smith